simple method for the fabrication of silica nanoparticle film based on the covalent-bonding interaction between carboxylic acid-functionalized
silica nanoparticles (SiO2–COOH) and amino-terminated silicon wafer was developed. Prior to assembly, silica nanoparticles with an average
diameter 80 nm were prepared using the Stöber method, amino-functionalized silica nanoparticles (SiO2–NH2) were prepared by a silanization
with 3-aminopropyltriethoxysilane (APTES), while carboxylic acid-functionalized silica nanoparticles (SiO2–COOH) were prepared by a ring
opening linker elongation reaction of the amine functions with succinic anhydride, at the same time, amino-terminated silicon wafer (Si–NH2) was
obtained by self-assembling 3-aminopropyltriethoxysilane, then one layer relative close-packed carboxylic acid-functionalized silica nanoparticles
(SiO2–COOH) was arranged on silicon wafer through amidation reaction under DCC coupling agent.
simple method for the fabrication of silica nanoparticle film based on the covalent-bonding interaction between carboxylic acid-functionalizedsilica nanoparticles (SiO2–COOH) and amino-terminated silicon wafer was developed. Prior to assembly, silica nanoparticles with an averagediameter 80 nm were prepared using the Stöber method, amino-functionalized silica nanoparticles (SiO2–NH2) were prepared by a silanizationwith 3-aminopropyltriethoxysilane (APTES), while carboxylic acid-functionalized silica nanoparticles (SiO2–COOH) were prepared by a ringopening linker elongation reaction of the amine functions with succinic anhydride, at the same time, amino-terminated silicon wafer (Si–NH2) wasobtained by self-assembling 3-aminopropyltriethoxysilane, then one layer relative close-packed carboxylic acid-functionalized silica nanoparticles(SiO2–COOH) was arranged on silicon wafer through amidation reaction under DCC coupling agent.
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