Mechanical engineering
From Mounting methodologies to measure EUV reticle nonflatness (SPIE Proceedings 7470, 2009), by the lab of UW–Madison Professor Roxanne L. Engelstad. Notice how Battula et al. signal the practical consequence of their findings and also suggest that another result would be possible depending on further research.
Unfortunately, to map the entire reticle with a single measurement, a 12 in. beam expander is needed. With such a large optical system, the expander must be held rigidly, not allowing it to tip or tilt. Since the UW-CMC mount must remain vertical to be effective, it cannot be used in this scenario. Consequently, the application of this mount is limited. Thus, a number of new designs have been proposed by industry to address the alignment issues and provide for other options, such as automated handling. Three of these designs are described and evaluated in the following sections.
Mechanical engineering
From Mounting methodologies to measure EUV reticle nonflatness (SPIE Proceedings 7470, 2009), by the lab of UW–Madison Professor Roxanne L. Engelstad. Notice how Battula et al. signal the practical consequence of their findings and also suggest that another result would be possible depending on further research.
Unfortunately, to map the entire reticle with a single measurement, a 12 in. beam expander is needed. With such a large optical system, the expander must be held rigidly, not allowing it to tip or tilt. Since the UW-CMC mount must remain vertical to be effective, it cannot be used in this scenario. Consequently, the application of this mount is limited. Thus, a number of new designs have been proposed by industry to address the alignment issues and provide for other options, such as automated handling. Three of these designs are described and evaluated in the following sections.
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