2.3.3. Focused ion beam (FIB) analysis
Dual beam FIB-SEM was used for cross-section milling of the
coating locally on the alloy matrix, and above the intermetallic particles. A Ga ion beam was operated at 30 kV with ion current in the range of 0.5–20 nA. Before milling, the areas of interest were covered by depositing Pt with a thickness of 2 m in order to protect it from the ion beam damage